JPH0258781B2 - - Google Patents

Info

Publication number
JPH0258781B2
JPH0258781B2 JP57026401A JP2640182A JPH0258781B2 JP H0258781 B2 JPH0258781 B2 JP H0258781B2 JP 57026401 A JP57026401 A JP 57026401A JP 2640182 A JP2640182 A JP 2640182A JP H0258781 B2 JPH0258781 B2 JP H0258781B2
Authority
JP
Japan
Prior art keywords
type
layer
region
substrate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57026401A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58142542A (ja
Inventor
Shuichi Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP57026401A priority Critical patent/JPS58142542A/ja
Publication of JPS58142542A publication Critical patent/JPS58142542A/ja
Publication of JPH0258781B2 publication Critical patent/JPH0258781B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP57026401A 1982-02-18 1982-02-18 誘電体分離構造の半導体集積回路装置の製造方法 Granted JPS58142542A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57026401A JPS58142542A (ja) 1982-02-18 1982-02-18 誘電体分離構造の半導体集積回路装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57026401A JPS58142542A (ja) 1982-02-18 1982-02-18 誘電体分離構造の半導体集積回路装置の製造方法

Publications (2)

Publication Number Publication Date
JPS58142542A JPS58142542A (ja) 1983-08-24
JPH0258781B2 true JPH0258781B2 (en]) 1990-12-10

Family

ID=12192529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57026401A Granted JPS58142542A (ja) 1982-02-18 1982-02-18 誘電体分離構造の半導体集積回路装置の製造方法

Country Status (1)

Country Link
JP (1) JPS58142542A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4721682A (en) * 1985-09-25 1988-01-26 Monolithic Memories, Inc. Isolation and substrate connection for a bipolar integrated circuit
JP3826161B2 (ja) * 1995-06-08 2006-09-27 株式会社 日本触媒 バナジウム含有触媒およびその製造方法、並びに、その使用方法

Also Published As

Publication number Publication date
JPS58142542A (ja) 1983-08-24

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